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SEMI C30 — Specifications and Guidelines for Hydrogen Peroxide
The method can be applied to wafers using the resistivity-measuring apparatus and procedures of SEMI MF84 if provisions are made for making measurements at several sites on the wafer
In epitaxial layers and in thin single crystal wafers
This Test Method is also applicable to off-line measurement provided that the requirements of the test method are satisfied
ESD Alliance 2023 Export Seminar On-Demand StdPbc-0420 SEMI C30 — Specifications andESD Alliance 2023 Export Seminar (On Demand): The Impact of New Regulations on the Semiconductor Design Ecosystem SEMINAR INFO: Original Date: April 26, 2023 This event was recorded live. CANCELLATION POLICY: No Cancellations. Event Contact pcohen@semi. org Paul Cohen
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