M00300 - SEMI M3 - Specifications for Polished Monocrystalline Sapphire Substrates StdTpc-Process Chemicals - Acids SEMI F33 — Method for

SEMI F33 — Method for Calibration of Atmospheric Pressure Ionization Mass Spectrometer (APIMS)

This Test Method includes several methods for canceling gravity-induced deflection which could otherwise alter the shape of the wafer

and testing principles set in this Safety Guideline for protection against electrical shock or fire risk

and determine the applicability of regulatory or other limitations prior to use

M00300 - SEMI M3 - Specifications for Polished Monocrystalline Sapphire Substrates StdTpc-Process Chemicals - Acids SEMI F33 — Method forThis standard was technically approved by the global Silicon Wafer Committee. This edition was approved for publication by the global Audits & Reviews Subcommittee on April 25, 2007. It was available at www. semi. org in June 2007. Originally published in 1978; previously published March 2004. NOTICE: This document was balloted and approved for withdrawal in 2007. Sapphire substrates are utilized for heteroepitaxial growth of silicon films for certain