M07100 - SEMI M71 - Specification for Silicon-on-Insulator (SOI) Wafers for CMOS LSI StdTpc-Process Chemicals - Bases SEMI MF1530-02 (first SEMI publication)

SEMI MF1530-02 (first SEMI publication)

NOTE 1: For determination of shallow and other defect densities in wafer production environments

This Guide provides further quality information on critical components such as ion exchange resin and filter media

SEMI E37 — High-Speed SECS Message Service (HSMS)

M07100 - SEMI M71 - Specification for Silicon-on-Insulator (SOI) Wafers for CMOS LSI StdTpc-Process Chemicals - Bases SEMI MF1530-02 (first SEMI publication)1 Purpose 1. 1 This Specification defines thin layer silicon on insulator (SOI) wafer requirements for CMOS large scale integrated circuit (LSI) devices. In the case of 200 and 300 mm wafers this Specification is targeted for nodes from 130 to 14 nm. In the case of 150 mm wafers, older LSI generations are included as well. By defining parameters, inspection procedures and acceptance criteria, both suppliers and customers may uniformly define product