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M04900 - SEMI M49 - 130 nmから65 nmへの技術世代のシリコンウェーハ用ジオメトリ測定システム規定のためのガイド Revision:SEMI M49-0613 - Superseded 1-1104 (Reapproved 0618)

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Description

1-1104 (Reapproved 0618)

especially predictive information

or surface ion contamination monitoring

5  This Safety Guideline provides industry-specific criteria

M04900 - SEMI M49 - 130 nmから65 nmへの技術世代のシリコンウェーハ用ジオメトリ測定システム規定のためのガイド Revision:SEMI M49-0613 - Superseded 1-1104 (Reapproved 0618)International Technology Roadmap for Semiconductors 1999 edition ITRS1309065 nmSEMI M1SEMI M8SEMI M11SEMI M24SEMI M38 Referenced SEMI Standards SEMI E1. 9 Mechanical Specification for Cassettes Used to Transport and Store 300 mm WafersSEMI E5 Specification for SEMI Equipment Communications Standard 2 Message Content (SECS II)SEMI E10 Specification for Definition and Measurement of Equipment Reliability, Availability, and Maintainability (RAM) and

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